Carbon Mesoporous Nanopowder

Product Name: Carbon Mesoporous Nanopowder (C, Purity: >99.9%, APS: < 100nm)

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Email: contact@nanochemazone.com

Please contact us for customization and price inquiry

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.

Glassy Carbon Spherical Powder

Product Name: Glassy Carbon Spherical Powder (C, Purity: 99.9%, APS: 2~12µm)

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Email: contact@nanochemazone.com

Please contact us for customization and price inquiry

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.

Palladium on Alumina Catalyst

Product Name: Palladium on Alumina Catalyst (Pd/Al2O3, Purity: >99.9%, APS: 40-60µm)

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Email: contact@nanochemazone.com

Please contact us for customization and price inquiry

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.

Tantalum Carbide Powder

Tantalum Carbide Powder (TaC, Purity: 99.9%, APS: 1000 nm, Cubic)

They are extremely hard, brittle, refractory ceramic materials with metallic electrical conductivity. They appear as brown-gray powders, which are usually processed by sintering.

Being important cermet materials, tantalum carbides are commercially used in tool bits for cutting applications and are sometimes added to tungsten carbide alloys.

The melting points of tantalum carbides peak at about 3880 °C depending on the purity and measurement conditions; this value is among the highest for binary compounds. Only tantalum hafnium carbide may have a slightly higher melting point of about 3942 °C, whereas the melting point of hafnium carbide is comparable to that of TaC.

Tantalum Carbide Application:

Tantalum Carbide Powder Applications

1. Tantalum carbide is often added to tungsten carbide/cobalt (WC/Co) powder attritions to enhance the physical properties of the sintered structure. It also acts as a grain growth inhibitors preventing the formation of large grains, thus producing materials of optimal hardness.
2. It is also used as a coating for steel molds in the injection molding of aluminum alloys. While providing a hard, wear-resistant surface, it also provides a low friction mold surface.
3. Tantalum carbide is also used in the production of sharp instruments with extreme mechanical resistance and hardness.
4. It is also used in tool bits for cutting tools.

Tantalum carbide is widely used as a sintering additive in ultra-high temperature ceramics (UHTCs) or as a ceramic reinforcement in high-entropy alloys (HEAs) due to its excellent physical properties in melting point, hardness, elastic modulus, thermal conductivity, thermal shock resistance, and chemical stability, which makes it a desirable material for aircraft and rockets in aerospace industries.

Nanochemazone specializes in producing high purity Tantalum Carbide Powder with the smallest possible average grain sizes for use in the preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low-Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas. Our standard powder particle sizes average in the range of - 325 mesh, - 100 mesh, 10-50 microns, and submicron (< 1 micron). We can also provide many materials in the nanoscale range.

Tantalum Carbide Related Information

Storage Conditions:

Airtight sealed, avoid light and keep dry at room temperature.  

Please contact us for customization and price inquiry

Email: contact@nanochemazone.com

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.