Single Crystal Silicon-Silicon dioxide Wafer
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Single Crystal silicon-silicon dioxide Wafer
Product Name: Single Crystal silicon-silicon dioxide Wafer
| Product Name | Single Crystal silicon-silicon dioxide Wafer P-type (4 inches) |
| Cat No. | NCZ-NSC318/20 |
| Día | 100 mm (4 inches) |
| Orientation | <100> |
| Wafer thickness | 500 micrometer |
| Resistivity | <0.01 |
| Polished | Front Side Polished |
| Thickness | 300 nm (dry) |
| Purity | 99.9% |
| Formula | Si/SiO2 |
Single Crystal silicon-silicon dioxide Wafer P-type Description :
Provided in a single wafer case
Silicon oxide wafer SIO2 thin-film among semiconductor technology, SiO2 thin film layers are mainly used as dielectric material and more recently, they are integrated with MEMS (Micro Electro Mechanical Systems) devices. The simplest way to produce silicon oxide layers on silicon wafers is to oxidize silicon with oxygen.
Single Crystal silicon-silicon dioxide Wafer RELATED INFORMATION
Storage Conditions:
Airtight sealed, avoid light and keep dry at room temperature.
Please email us for the customization.
Email: contact@nanochemazone.com
Note: We supply different size ranges of nano and micron size powder as per the client’s requirements and also accept customization in various parameters.
Note: For pricing & ordering information, please contact us at sales@nanochemazone.com
Please contact us for quotes on Larger Quantities & Customization. E-mail: contact@nanochemazone.com
Customization:
If you are planning to order large quantities for your industrial and academic needs, please note that customization of parameters (such as size, length, purity, functionalities, etc.) are available upon request.
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Calcium Magnesium Silicate |
| CAS No. | N/A |
| Appearance | White |
| Purity | 99% |
| APS | 1-5µM (Can be customized) |
| Ingredient | CaMgSi2O6:Eu(2+) |
| Product Code | NCZ-NSC614/20 |
| Molecular Weight | 156.47 g/mol |
| Density | 2.9 g/cm3 |
| Melting Point | 2,130 °C (3,870 °F; 2,400 K) |
Calcium Magnesium Silicate Description
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Related Information
Storage Conditions:
Airtight sealed, avoid light and keep dry at room temperature.
Please contact us for customization and price inquiry
Email: contact@nanochemazone.com
Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.
Copper Vanadium Oxide
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Copper Vanadium Oxide |
| Colour | N/A |
| Purity | 99% |
| Particle Size | 1-5µM (customizable) |
| Ingredient/MF | CuO6V2 |
| Product Code | NCZ-CP-397/20 |
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Storage Conditions: Airtight sealed, avoid light and keep dry at room temperature. Please contact us for customization and price inquiry Email: contact@nanochemazone.com Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters
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| Product | Gallium Nitride |
| CAS No. | 25617-97-4 |
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Single Crystal Silicon Dioxide Wafer P-Type
Single Crystal Silicon Dioxide Wafer P-Type
Product Name: Single Crystal Silicon Dioxide Wafer P-Type
| Product Name | Single Crystal Silicon Dioxide Wafer P-Type |
| Cat. No. | NCZ-NSC 319/20 |
| Diameter | 100 mm +-0.2 mm (4″) |
| Oxide Thickness | 300 ±20 nm (dry) |
| Color | Violet |
| Thickness | 500 ± 20 micron |
| Resistivity | 1-10 ohm-cm |
| Type/Dopant | P |
| Orientation | <100> |
Single Crystal Silicon Dioxide Wafer P-Type (4 inches) Description
Single Crystal Silicon Dioxide Wafer P-Type NanoChemazone produces Silicon Oxide Wafer with the highest possible density. Our standard wafer size is nominally 25.4 mm (1 inch) to 300 mm (11.8 inches). Materials are produced using crystallization, solid-state, and other ultra-high purification processes such as sublimation.
This process forms a cylindrical ingot which is then sliced and polished to form wafers. NanoChemazone High Purity (99.999%) Silicon Oxide Wafers- Polished & Unpolished specializes in producing custom compositions for commercial and research applications and new proprietary technologies.
NanoChemazone also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles and in the form of solutions and organometallics. We also produce Silicon as rod, pellets, powder, pieces, disc, ingot, wire, and in compound forms, such as oxide. Other shapes are available by request.
Single Crystal Silicon Dioxide Wafer P-Type (4 inches) RELATED INFORMATION
Storage Conditions: Airtight sealed, avoid light, and keep dry at room temperature. Please email us for the customization. Email: contact@nanochemazone.com Note: We supply different size ranges of nano and micron size powder as per the client’s requirements and also accept customization in various parameters.
Single Crystal Silicon Wafer N-Type
Single Crystal Silicon Wafer N-Type (1 inch)
Product Name: Single Crystal Silicon Wafer N-Type (1 inch)
| Product Name | Single Crystal Silicon Wafer N-Type (1 inch) |
| Cat No. | NCZ-NSC330/20 |
| Size | 1 inch |
| Thickness | 300-380 micro-meter |
| Type | N-type |
| Dopant | Phosphorus |
| Resistivity | 1-10 ohm/cm |
| Surface | Single side polished |
| Boling Point | 2355 °C (lit.) |
| Melting Point | 1240 °C,1410 °C (lit.) |
| Density | 2.33 g/mL at 25 °C (lit.) |
| Semiconductor Properties | <100>, N-type |
| SMILES string | [Si] |
Single Crystal Silicon Wafer N-Type (1 inch). We have heated polished doped single-crystal silicon wafers in a single-mode microwave cavity to temperatures where surface to surface bonding occurred. The absorption of microwaves and heating of the wafers is attributed to the inclusion of n-type or p-type impurities into these substrates.
A cylindrical cavity TM (sub 010) standing wave mode was used to irradiate samples of various geometry at positions of high magnetic field. This process was conducted in a vacuum to exclude plasma effects.
This initial study suggests that the inclusion of impurities in single crystal silicon significantly improved its microwave absorption (loss factor) to a point where heating silicon wafers directly can be accomplished in minimal time. Bonding of these substrates, however, occurs only at points of intimate surface to surface contact. The inclusion of a thin metallic layer on the surfaces enhances the bonding process.
Please email us for the customization. Email: contact@nanochemazone.com Please contact us for customization and price inquiry Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in the various parameters
Single Crystal Silicon Wafer N-Type (3-inch)
Single Crystal Silicon Wafer N-Type (3-inch)
Product Name: Single Crystal Silicon Wafer N-Type (3-inch)
| Product Name | Single Crystal Silicon Wafer N-Type (3-inch) |
| Cat No. | NCZ-NSC333/20 |
| Type | N |
| Dia | 3 Inch |
| Doping | N-type |
| Resistivity | (1-10 Ohm/sq). |
| Thickness | 290 + 10 µm |
| Orientation | 100 |
| Polished | Single side polished |
| Form | crystalline (cubic (a = 5.4037) |
| Polished | wafer (single side polished) |
| does not contain | dopant |
| Día | 2 inch |
| Thickness | 0.5 mm |
| Boling Point | 2355 °C (lit.) |
| Melting Point | 1410 °C (lit.) |
| Density | 2.33 g/mL at 25 °C (lit.) |
| Semiconductor properties | <100>, N-type |
| SMILES string | [Si] |
Single Crystal Silicon Wafer N-Type (3-inch), NanoChemazone Supplies provides both standard and customized high-quality single crystals, wafers and substrates for a wide range of applications such as LED, ferroelectric, piezoelectric, electro-optical, photonics, high power electronics, and high-frequency power devices, just to name a few. Customized crystal growth, precision machining, and coating services are available. Please contact us today to discuss your project requirements.
Please email us for the customization. Email: contact@nanochemazone.com Please contact us for customization and price inquiry Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in the various parameters.
Single Crystal Silicon Wafer N-type (4-inch)
Single Crystal Silicon Wafer N-type (4-inch)
Product Name: Single Crystal Silicon Wafer N-type (4-inch)
| Product Name | Single Crystal Silicon Wafer N-type (4-inch) |
| Cat No. | NCZ-NSC331/20 |
| Día | 4 inches |
| Type | N |
| Diameter (mm) | 4” (100.8mm) |
| Type | N-Type |
| Doping | Phosphorous |
| Crystal Orientation | <100> |
| Surface: | Single Side Polished |
| Thickness | 250-500μm |
| Resistivity | 1-10ohm-cm |
| Crystal method | CZ |
| RRG (%) | ≤12 |
| Oxygen Contents (ppm) | 12.5-16.5 |
| Carbon Contents (ppm) | ≤1 |
Wafer resizing is sometimes referred to as wafer coring, re-sizing, cut down, cut-down, downsizing, down-sizing, size reducing or size reduction. We can accept orders ranging from a single wafer to hundreds of wafers per month. Our process is efficient, innovative, and ESD friendly. Our proprietary process causes less stress to the silicon wafer than other resizing methods. We also round wafer edges to eliminate edge chipping.
We frequently work with 2” (50 mm), 3” (75 mm), 100 mm (4”), 125 mm (5”), 150 mm (6”), 200 mm (8”), and 300 mm wafers; however, we are also capable of producing custom non-standard sizes.
Please email us for the customization. Email: contact@nanochemazone.com Please contact us for customization and price inquiry Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in the various parameters.
Single Crystal Silicon Wafer P-type,
Single Crystal Silicon Wafer P-type,
| Product Name | Single Crystal Silicon Wafer P-type |
| Cat No. | NCZ-NSC332/20 |
| Día | 3 inch |
| Diameter | 76.2mm ± 0.3mm (3 inches) |
| Type | P |
| Orientation | <100> |
| Thickness | 400±10um |
| Resistivity | 1-10 ohm-cm |
| Polished | Single side polished |
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