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CVD Graphene on SiO2 Substrate
₹0.00
Product Name |
CVD Graphene on SiO2 Substrate/Wafer |
Stock No. | NCZ-GSW-0018 |
Purity | > 99.9% |
Graphene Film | |
FET Electron Mobility on Al2O3 | 2000 cm2/Vs |
Hall Electron Mobility on SiO2/Si | Â 4000 cm2/Vs |
PRODUCT DETAIL
CAS No.: 7782-42-5 (graphene), 7631-86-9 (silicon dioxide), 7440-21-3 (silicon)
Sheet Resistance | <600Ω/sq |
Custom Order | <300Ω/sq |
Transparency | >95% |
GRAPHENE ON SILICON DIOXIDE (300NM)/SI SUBSTRATE (P-TYPE, 1-10 Ω·CM)Â
CVD Graphene | Substrate |
1cm x 1cm | 1.5cm x 1.5cm, thickness: 300nm SiO2/700um Si |
1inch x 1inch | 3.0cm x 3.0cm, thickness:Â 300nm SiO2/700um Si |
3cm x 3cm | 3.5cm x 3.5cm, thickness:Â 300nm SiO2/700um Si |
7cm x 7cm | Diameter: 4inch, thickness:Â 300nm SiO2/600um Si |
Categories: CVD Graphene, Graphene Nanostructures
Description
Note: For pricing & ordering information, please contact us at sales@nanochemazone.com
Please contact us for quotes on Larger Quantities & Customization. E-mail: contact@nanochemazone.com
Customization:
If you are planning to order large quantities for your industrial and academic needs, please note that customization of parameters (such as size, length, purity, functionalities, etc.) are available upon request.
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Stock No. | NCZ-GSW-0017 |
Purity | > 99.9% |
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FET Electron Mobility on Al2O3 | 2000 cm2/Vs |
Hall Electron Mobility on SiO2/Si | Â 4000 cm2/Vs |
Sheet Resistance |  450±40 Ω/sq (1cm x1cm) |
Transparency | >95% |
- Copper-based graphene is prepared by CVD method.
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SILICON WAFER:
Wafer Thickness: | 525 µm, (customization is possible) |
Resistivity: | <0.01 ohm-cm |
Type/Dopant: | P/N |
Orientation: | <100> (customization is possible) |
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Length | 10-20 μm (Customization possible) |
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Stock No. | NCZ-GSW-0011 |
Purity | > 99.9% |
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FET Electron Mobility on Al2O3 | 2000 cm2/Vs |
Hall Electron Mobility on SiO2/Si | 4000 cm2/Vs |
Sheet Resistance |  450±40 Ω/sq (1cm x1cm) |
- Four thicknesses of CVD graphene:Â Available in either 1, 2, 3-5 or 6-8 layers
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Type | Thickness of the Graphene | Transparency | Support Film |
1 Layer | ~0.35nm | ~96.4% | Ultra-flat Silicon |
2 Layers | ~0.7nm | ~92.7% | Ultra-flat Silicon |
3-5 Layers | 1.0-1.7nm | ~85.8-90.4% | Ultra-flat Silicon |
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Graphene on Ultra-Fine 200 Mesh Copper TEM Grids
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Graphene coated TEM Grids
Product Name | Graphene On Ultra-Fine 200 Mesh Copper TEM Grids |
Stock No. | NCZ-GSW-0014 |
Purity | > 99.9% |
Graphene Film | |
FET Electron Mobility on Al2O3 | 2000 cm2/Vs |
Hall Electron Mobility on SiO2/Si | Â 4000 cm2/Vs |
Sheet Resistance |  450±40 Ω/sq (1cm x1cm) |
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2 Layers | Â ~0.7 nm | Â ~92.7% | 200 Mesh Copper Grid | N/A |
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Hydroxylated Graphene Quantum Dots
CAS Number          | 7440-40-0 |
Product Number | NCZC3002 |
Concentration | 1mg/mL to 20 mg/mL (in stock), Concentration Customization is Possible |
Carrier | Water, Ethanol, IPA, NMP, Toluene, Methanol, Dispersion Customization is Possible |
APS | 5-10 nm (Customization is Possible) |
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Appearance: | Colorless solution |
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